Hafniumlanka
Hafnium wire
Purity | Hf+Zr > 99.98%, Zr < 1% |
Standard | ASTM B737 |
Size | Dia: 0.1mm-5.0mm ( tolerance: +/-0.05mm ) |
Condition | Cold drawn, Annealed |
Shape | Coils or Customers’ Requests |
Surface | Silver metal |
Packing | Standard seaworthy packages or as your requests |
Export Indian hafnium wire
Specifications: Dia2.15*coil
Quantity: 4
Weight 50.8KG
Standard: ASTM B737
application:
Zhuohangxin Metal specializes in the production of high-purity uniform-shaped hafnium wire with the highest density for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) processes, including thermal and electron beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metal Organic and Chemical Vapor Deposition (MOCVD).
For the production of superalloys
used as solder
for plasma cutting
The plasma emitter in the plasma cutting electrode
Because of its strong ability to release electrons into the air and its high melting point, hafnium is a key component of electrodes in plasma cutting. High-purity hafnium wire has better wear resistance in plasma cutting.
We also produce hafnium in the form of powder, ingots, sheets, tubes, discs, granules and compounds such as oxides. Other shapes are available upon request.