Korkean puhtauden 99,6% pvd m86 titaani kohde od 98x40mm ti kohde titaani

sputtering target Product Description Titanium sputtering target is mainly used for physical vapor deposition (PVD) process to deposit thin film coating on the surface of the substrate. The sputtering target material is usually made of high purity metals, alloys or compounds. Titanium sputtering target is mainly used for physical vapor deposition (PVD) process to deposit thin film coating on the surface of the substrate. The sputtering target material is usually made of high purity metals, alloys or compounds. Titanium sputtering target is mainly used for physical vapor deposition (PVD) process to deposit thin film coating on the surface of the substrate. The sputtering target material is usually made of high purity metals, alloys or compounds. Specification Material Titanium Grade m86 Purity 99.6% Shape Disc, plate, tube, etc. Dimension Customized Application Physical vapor deposition (PVD) process Features 1. High purity 2. Good electrical and thermal conductivity 3. Good corrosion resistance 4. High strength and hardness 5. Low density 6. Good ductility 7. Good weldability Application Titanium sputtering target is mainly used for physical vapor deposition (PVD) process to deposit thin film coating on the surface of the substrate. Packaging & Shipping We usually use wooden box to pack the target, and the size of the box is customized according to the size of the target. We can ship the target by air, by sea or by express.

Titanium targets exported to Japan

Application & Features
1. Corrosion resistance, high temperature resistance, light weight material
2. Mainly used in electronics, chemical industry, watches, glasses, accessories, sporting goods, mechanical equipment, electroplating equipment, environmental protection, golf, precision machining and other industries
 3. Commonly used size targets, processed according to size, others according to drawings
4. Common shapes are round, sheet, tubular, U-shaped, etc.